ABRASIVE GRAIN, PRODUCTION METHOD THEREOF, PRODUCTION METHOD OF SLURRY, POLISHING LIQUID, PRODUCTION METHOD THEREOF AND POLISHING METHOD

PROBLEM TO BE SOLVED: To provide a production method of abrasive grains capable of suppressing the content of coarse particles, and obtaining sufficient polishing speed of an insulation material.SOLUTION: A production method of abrasive grains includes a step of obtaining aqueous solution by mixing...

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Bibliographic Details
Main Authors NOMURA MICHIYUKI, SAKURAI HARUAKI, ARAKAWA KEITA
Format Patent
LanguageEnglish
Japanese
Published 18.02.2016
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Summary:PROBLEM TO BE SOLVED: To provide a production method of abrasive grains capable of suppressing the content of coarse particles, and obtaining sufficient polishing speed of an insulation material.SOLUTION: A production method of abrasive grains includes a step of obtaining aqueous solution by mixing together a salt of a metal element, a precursor of a first base and water, a conversion step of converting the precursor of the first base into the first base in the aqueous solution, and a heating step of heating liquid obtained in the conversion step.SELECTED DRAWING: None 【課題】粗大粒子の含有量が抑えられ、且つ、絶縁材料の充分な研磨速度が得られる砥粒の製造方法を提供する。【解決手段】金属元素の塩と、第一の塩基の前駆体と、水とを混合して水溶液を得る工程、前記水溶液中で前記第一の塩基の前駆体を第一の塩基に変換する変換工程、及び、前記変換工程で得られた液を加熱する加熱工程、を含む、砥粒の製造方法。【選択図】なし
Bibliography:Application Number: JP20150121243