SELF-CLEANING SMUDGE-RESISTANT STRUCTURE AND RELATED FABRICATION METHODS

PROBLEM TO BE SOLVED: To provide: an apparatus for a smudge-resistant structure that is resistant to fingerprints, smudges, scratches and/or other marks without degrading the display image quality; and related fabrication methods.SOLUTION: A smudge-resistant structure 100 includes a transparent subs...

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Bibliographic Details
Main Authors CERMA R CARULLI, SCHMIDT JOHN F L
Format Patent
LanguageEnglish
Japanese
Published 28.01.2016
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide: an apparatus for a smudge-resistant structure that is resistant to fingerprints, smudges, scratches and/or other marks without degrading the display image quality; and related fabrication methods.SOLUTION: A smudge-resistant structure 100 includes a transparent substrate 102 having a macrostructured surface 106 configured to reduce contact with the transparent substrate, and an oxidizing layer 120 overlying the macrostructured surface. 【課題】ディスプレイ画像品質を低下させることなく、指紋、汚れ、引っかき傷及び／又は、他の跡に対して抵抗性がある防汚性構造体のための装置及び関連する製造方法を提供する。【解決手段】防汚性構造体１００は、その透明基板との接触を低減するように構成されるマクロ構造化表面（ｍａｃｒｏｓｔｒｕｃｔｕｒｅｄ ｓｕｒｆａｃｅ）１０６を有する透明基板１０２と、マクロ構造化表面を覆う酸化層１２０とを含む。【選択図】図３
Bibliography:Application Number: JP20150123565