MANUFACTURING METHOD OF FABRY-PEROT INTERFEROMETER

• Main Authors: IWAKI TAKAO, HIRAO KENJI, ENOMOTO TETSUYA, SUZUKI YOSHIMI
• Format: Patent
• Language: English; Japanese
• Published: 18.01.2016
• Subjects: COLORIMETRY; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT; MEASURING; MICROSTRUCTURAL TECHNOLOGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PERFORMING OPERATIONS; PHYSICS; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS; RADIATION PYROMETRY; TESTING; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a manufacturing method of a Fabry-Perot interferometer having air layers, capable of preventing stress from locally concentrating at a high refractive index layer forming movable mirrors, while adopting multiply segmented fixed mirrors.SOLUTION: At an intermediate sacrificial layer formation process, a first sacrificial layer 40 is formed on a second high refractive index layer 31. Next, a second sacrificial layer 41 is formed on the first sacrificial layer 40 using material different from the first sacrificial layer 40, and the planarization of the second sacrificial layer 41 is performed by the heating. Then, a third sacrificial layer is formed on the second sacrificial layer 41 having been planarized, using the same material as the first sacrificial layer 40, thus forming an intermediate sacrificial layer including the first sacrificial layer 40, the second sacrificial layer 41, and the third sacrificial layer. The first sacrificial layer 40 and the third sacrificial layer are formed using material of which fluidity when heated is lower than the second sacrificial layer 41. At the planarization process, among the first sacrificial layer 40 and the second sacrificial layer 41, only the second sacrificial layer 41 is made to flow. 【課題】空気層を有し、複数に分割された固定ミラーを採用しつつ、可動ミラーを構成する高屈折率層に局所的な応力集中が生じるのを抑制することができるファブリペロー干渉計の製造方法を提供する。【解決手段】中間犠牲層形成工程では、第２高屈折率層３１上に第１犠牲層４０を形成する。次いで、第１犠牲層４０とは異なる材料を用いて、第１犠牲層４０上に第２犠牲層４１を形成するとともに、加熱により第２犠牲層４１の平坦化処理を行う。次いで、第１犠牲層４０と同じ材料により、平坦化後の第２犠牲層４１上に第３犠牲層を形成して、第１犠牲層４０、第２犠牲層４１、及び第３犠牲層を含む中間犠牲層を形成する。その際、第１犠牲層４０及び第３犠牲層を、第２犠牲層４１よりも熱に対する流動性が低い材料を用いて形成し、平坦化処理において、第１犠牲層４０及び第２犠牲層４１のうち、第２犠牲層４１のみを流動させる。【選択図】図４