METHOD FOR MANUFACTURING POLARIZING FILM, AND ITS APPLICATION

PROBLEM TO BE SOLVED: To provide a method for manufacturing a polarizing film, by which a polarizing film with high heat resistance can be manufactured.SOLUTION: A method for manufacturing a polarizing film including a light-absorbing anisotropic layer is provided, which comprises applying the follo...

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Bibliographic Details
Main Authors MORISHIMA SHINICHI, TERADA YUJI, TAKASAGO RIE
Format Patent
LanguageEnglish
Japanese
Published 12.01.2016
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Summary:PROBLEM TO BE SOLVED: To provide a method for manufacturing a polarizing film, by which a polarizing film with high heat resistance can be manufactured.SOLUTION: A method for manufacturing a polarizing film including a light-absorbing anisotropic layer is provided, which comprises applying the following dichroic dye composition on a surface of an alignment layer formed on a substrate so as to form the light-absorbing anisotropic layer: the dichroic dye composition contains a dichroic dye polymer represented by general formula (II) in an amount larger than 70 mass% of the total mass. In the formula, Rrepresents a hydrogen atom or a methyl group; L represents a single bond, -(CH)O-, or the like; A and B represent a phenylene group which may have a substituent, a naphthylene group which may have a substituent, or the like; Rrepresents a phenylene group which may have a substituent, a naphthylene group which may have a substituent, or an anthranilene group which may have a substituent; m represents an integer of 1 to 3; and n represents an integer of 2 or more. 【課題】耐熱性の高い偏光膜を製造することができる偏光膜の製造方法を提供すること。【解決手段】光吸収異方性層を含む偏光膜の製造方法であって、光吸収異方性層を一般式(II)で表される二色性色素ポリマーを、総質量の70質量%より多く含む二色性色素組成物を基板上に形成された配向層表面に塗布することを含む方法で形成する。式中、R1は水素原子またはメチル基を表し;Lは単結合、−(CH2)x1O−等を示し;AおよびBは、置換基を有してもよいフェニレン基、置換基を有してもよいナフチレン基等を示し;R2は置換基を有していてもよいフェニレン基、置換基を有してもよいナフチレン基、置換基を有してもよいアントラニレン基を表し、mは1〜3、nは2以上の整数を表す。【選択図】なし
Bibliography:Application Number: JP20140122075