METHOD FOR DEPOSITION OF SILICON-CONTAINING FILM

• Main Authors: HAIRPIN CHANDRA, MARC O'NEAL LEONARD, XIAO MANCHAO, PEARLSTEIN RONALD MARTIN, HAN BING, KARWACKI EUGENE JOSEPH JR, LEI XINJIAN
• Format: Patent
• Language: English; Japanese
• Published: 24.12.2015
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CORRECTING FLUIDS; DIFFUSION TREATMENT OF METALLIC MATERIAL; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FILLING PASTES; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; USE OF MATERIALS THEREFOR; WOODSTAINS

PROBLEM TO BE SOLVED: To provide a composition for deposition of a carbon-doped silicon-containing film.SOLUTION: A composition comprises: a first precursor including at least one compound selected from a group consisting of an organic amino alkyl silane having the formula, RSi(NRR)H(where x=1, 2, 3), an organic alkoxy alkyl silane having the formula, RSi(OR)H(where x=1, 2, 3), an organic aminosilane having the formula, RN(SiR(NRR)H), an organic aminosilane having the formula, RN(SiRLH), and a combination thereof; and an appropriate second precursor including a compound having the formula, Si(NRR)H. 【課題】炭素ドープケイ素含有膜を堆積するための組成物を提供する。【解決手段】この組成物は、Ｒ５Ｓｉ（ＮＲ３Ｒ４）ｘＨ３−ｘ（ここで、ｘ＝１、２、３）の式を有する有機アミノアルキルシラン、Ｒ６Ｓｉ（ＯＲ７）ｘＨ３−ｘ（ここで、ｘ＝１、２、３）の式を有する有機アルコキシアルキルシラン、Ｒ８Ｎ（ＳｉＲ９（ＮＲ１０Ｒ１１）Ｈ）２の式を有する有機アミノシラン、Ｒ８Ｎ（ＳｉＲ９ＬＨ）２の式を有する有機アミノシラン及びこれらの組合せからなる群より選択される少なくとも１つの化合物を含む第１の前駆体並びにＳｉ（ＮＲ１Ｒ２）Ｈ３の式を有する化合物を含む随意の第２の前駆体を含有する。【選択図】図１