METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which can solve a problem that dispersion in flatness occurs within a wafer surface.SOLUTION: A method of manufacturing a semiconductor device prepares a wafer on which an insulator having plural portions serving as se...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
21.12.2015
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Subjects | |
Online Access | Get full text |
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