GLASS PLATE PRODUCTION METHOD AND GLASS PLATE POLISHING DEVICE

• Main Authors: MISUMI TAKARA, ITAKURA KEI
• Format: Patent
• Language: English; Japanese
• Published: 21.12.2015
• Subjects: DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a glass plate production method and a glass plate polishing device that can improve the polishing efficiency of an end surface of a glass plate.SOLUTION: In a glass plate production method, in a state where polishing slurry 24 held in a magnetic field formed by a first magnetic field forming member 22 and a second magnetic field forming member 23 is rotated around a rotary shaft 21 together with the first magnetic field forming member 22 and the second magnetic field forming member 23, an end 92a of the glass plate 92 is brought into contact with the polishing slurry 24 to be polished. A magnetic flux from the first magnetic field forming member 22 to the second magnetic field forming member 23 is concentrated by a magnetic flux concentration member 25 to increase the density of the magnetic flux. The magnetic flux concentration member 25 is a magnetic material mounted to the first magnetic field forming member 22 and the second magnetic field forming member 23. The end 92a of the glass plate 92 is brought into contact with the polishing slurry 24 held in a space having a magnetic flux density increased by the magnetic flux concentration member 25. 【課題】本発明の目的は、ガラス板の端面の研磨効率を向上させることができるガラス板の製造方法、および、ガラス板の研磨装置を提供することである。【解決手段】ガラス板の製造方法は、第１磁場形成部材２２および第２磁場形成部材２３が形成する磁場に保持された研磨スラリー２４を、第１磁場形成部材２２および第２磁場形成部材２３と共に回転シャフト２１周りに回転させた状態で、研磨スラリー２４にガラス板９２の端部９２ａを接触させて端部９２ａを研磨する。磁束集中部材２５により、第１磁場形成部材２２から第２磁場形成部材２３に向かう磁束を集中させて、磁束の密度を増加させる。磁束集中部材２５は、第１磁場形成部材２２および第２磁場形成部材２３に取り付けられる磁性体である。磁束集中部材２５により磁束の密度が増加した空間に保持される研磨スラリー２４にガラス板９２の端部９２ａを接触させる。【選択図】図５