METHOD FOR MANUFACTURING GLASS SUBSTRATE

• Main Author: ITO SHO
• Format: Patent
• Language: English; Japanese
• Published: 14.12.2015
• Subjects: ADVERTISING; BASIC ELECTRIC ELEMENTS; CRYPTOGRAPHY; DISPLAY; DISPLAYING; EDUCATION; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; LABELS OR NAME-PLATES; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; PERFORMING OPERATIONS; PHYSICS; SEALS; SEMICONDUCTOR DEVICES; SIGNS; TRANSPORTING

PROBLEM TO BE SOLVED: To smoothly release a glass film after processed in manufacturing a glass substrate by using a laminate and to prevent degradation in qualities of the glass substrate.SOLUTION: A method for manufacturing a glass substrate is provided, which includes: a laminate preparation step of bringing a glass film 1 and a support glass 2 in contact with each other on surfaces to tightly adhere to prepare a laminate 3; a processing step of forming an electronic device material 4 on the glass film 1 of the laminate 3 to prepare a glass substrate 5; and a release step of releasing the whole glass substrate 5 from the support glass 2. After the processing step is carried out and before the release step is carried out, a release start point formation step is carried out, in which the laminate 3 is irradiated with a pulse laser light 6 so as to release a part of the glass substrate 5 from the support glass 2 in an inclusion region 6y that includes an irradiation region 6x by the laser light so as to form a release start point 5x where the release step starts. 【課題】積層体を利用してガラス基板を製造する際に、処理を終えたガラスフィルムの円滑な剥離を可能とし、且つガラス基板の品質の低下を防止すること。【解決手段】ガラスフィルム１と支持ガラス２とを、面接触させて相互に密着させた積層体３を作製する積層体作製工程と、積層体３におけるガラスフィルム１に電子デバイス材４を形成してガラス基板５とする処理工程と、支持ガラス２からガラス基板５の全体を剥離させる剥離工程とを含んだガラス基板の製造方法であって、処理工程の実行後で、且つ剥離工程の実行前に、積層体３にパルスレーザー６を照射して、その照射領域６ｘを含んだ包含領域６ｙで支持ガラス２からガラス基板５の一部を剥離させることで、剥離工程の起点となる剥離起点部５ｘを形成する剥離起点部形成工程を実行するようにした。【選択図】図４