DEFECT ANALYSIS DEVICE AND DEFECT ANALYSIS METHOD

PROBLEM TO BE SOLVED: To provide a defect analysis device and a defect analysis method, capable of accurately detecting the period of periodic defect.SOLUTION: A defect analysis device clusters defects in clustering processing S12; extracts feature information from each cluster (step S13); classifie...

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Bibliographic Details
Main Authors FUJIHIRA MASANOBU, KATAYAMA RYO
Format Patent
LanguageEnglish
Japanese
Published 03.12.2015
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a defect analysis device and a defect analysis method, capable of accurately detecting the period of periodic defect.SOLUTION: A defect analysis device clusters defects in clustering processing S12; extracts feature information from each cluster (step S13); classifies the clusters on the basis of the extracted feature information (step S14); and executes period detection processing S2 to the cluster classified into a periodic defect group, and detects the period of the periodic defect (step S2). 【課題】正確に周期性欠陥の周期を検出することが可能な欠陥分析装置及び欠陥分析方法を提供する。【解決手段】欠陥分析装置は、クラスタリング処理Ｓ１２において欠陥をクラスタリングし、各クラスタから特徴情報を抽出し（ステップＳ１３）、抽出された特徴情報に基づいてクラスタを分類する（ステップＳ１４）。その後、欠陥分析装置は、周期性欠陥群に分類されたクラスタに対して周期検出処理Ｓ２を実行し、周期性欠陥の周期を検出する（ステップＳ２）。【選択図】図３
Bibliography:Application Number: JP20140096714