MICROWAVE IRRADIATION DEVICE AND MICROWAVE IRRADIATION METHOD

• Main Authors: AWAKURA YASUTAKA, MAEDA SHINSAKU, AKAO TAKAYOSHI
• Format: Patent
• Language: English; Japanese
• Published: 26.11.2015
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMISTRY; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; LIME, MAGNESIA; METALLURGY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; REFRACTORIES; SLAG; THEIR RELEVANT APPARATUS; TRANSPORTING; TREATMENT OF NATURAL STONE

PROBLEM TO BE SOLVED: To reduce a frequency of cracking an irradiated surface of a body to be heated when irradiating the body to be heated with a converged microwave.SOLUTION: A microwave irradiation device includes: a microwave source generating a microwave of which the frequency is 10 GHz to 300 GHz; a reflection mechanism for reflecting and converging the microwave generated from the microwave source; and a pedestal on which an object (a body to be heated) to be irradiated with the microwave reflected by the reflection mechanism is placed. By utilizing the microwave irradiation device, the body to be heated placed on the pedestal is irradiated with the reflected and converged microwave. The body to be heated is irradiated with the reflected microwave in the state where a permeation plate of which the "half-life depth " is 100 mm or more and which is formed from a "microwave permeable material" is interposed in an area where the reflected microwave passes, between the reflection mechanism and the body to be heated placed on the pedestal. 【課題】集光されたマイクロ波を被加熱体に照射する際、被加熱体の照射面にクラックが発生する頻度を低減すること。【解決手段】周波数が１０ＧＨｚ〜３００ＧＨｚのマイクロ波を発生するマイクロ波源と、前記マイクロ波源から発生したマイクロ波を反射して集光する反射機構と、前記反射機構によって反射されたマイクロ波が照射される対象（被加熱体）が載置される載置台と、を備えたマイクロ波照射装置を利用して、前記載置台に載置された前記被加熱体に前記反射されたマイクロ波が集光して照射される。前記反射機構と前記載置台に載置された前記被加熱体との間における前記反射されたマイクロ波が通過する領域に、「半減深さ」が１００ｍｍ以上である「マイクロ波を透過する材料」で構成された透過板を介在させた状態で、前記被加熱体に前記反射されたマイクロ波が照射される。【選択図】図５