CLEANING SOLVENT, CLEANING EQUIPMENT, AND METHOD FOR CLEANING MOUNTING SUBSTRATE

PROBLEM TO BE SOLVED: To provide a cleaning solvent, cleaning equipment, and a method for cleaning a mounting substrate which enable the execution of high-quality cleaning even with a novel solder, such as a lead-free solder.SOLUTION: A cleaning solvent 2 is used to clean a mounting substrate 10. Th...

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Bibliographic Details
Main Authors KINUGAWA MASARU, KAMO YOSHIYUKI
Format Patent
LanguageEnglish
Japanese
Published 19.11.2015
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CHEMISTRY
CLEANING
CLEANING IN GENERAL
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FATTY ACIDS THEREFROM
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
METALLURGY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
PRINTED CIRCUITS
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
TRANSPORTING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:PROBLEM TO BE SOLVED: To provide a cleaning solvent, cleaning equipment, and a method for cleaning a mounting substrate which enable the execution of high-quality cleaning even with a novel solder, such as a lead-free solder.SOLUTION: A cleaning solvent 2 is used to clean a mounting substrate 10. The cleaning solvent 2 is a chemical solution comprising: a hydrocarbon based solvent containing ketone or aromatics; organic amines included in the solvent; and an anhydrous unsaturated carboxylic acid compound or an anhydrous carboxylic acid added to the solvent. The organic amines include at least one kind of diethanolamine and trimethylamine, which are a secondary or tertiary amine. That is, the cleaning solvent 2 includes at least one kind of dehydrated unsaturated carboxylic acid compounds (e.g. anhydrous abietic acid and anhydrous neoabietic acid), and dehydrated dicarboxylic acids (e.g. formic acid, anhydrous acetic acid, and anhydrous valerianic acid). The amine components are equal to or less than the carboxylic acids in chemical equivalent. 【課題】鉛フリーはんだなどの新規のはんだにおいても高品質の洗浄を行うことのできる洗浄液、洗浄設備、および実装基板の洗浄方法を提供する。【解決手段】洗浄液２で実装基板１０を洗浄する。洗浄液２は、ケトンまたは芳香族類を含む炭化水素系の溶剤に有機アミン類を含有させ、かつこの溶剤に無水不飽和カルボン酸化合物または無水カルボン酸を添加した薬液である。有機アミン類は、２級または３級アミンであるジエタノールアミンまたはトリメチルアミンなどを少なくとも１種類以上含むものとする。つまり、洗浄液２は、脱水した不飽和カルボン酸化合物（無水アビエチン酸、無水ネオアビエチン酸など）もしくは脱水したジカルボン酸（ギ酸、無水酢酸、無水吉草酸など）を少なくとも１種類以上含むものである。アミン成分はカルボン酸種の当量以下とする。【選択図】図１
Bibliography:Application Number: JP20140088461