SURFACE TREATMENT SUBSTRATE
PROBLEM TO BE SOLVED: To provide a surface treatment substrate capable of suppressing effectively decline of solder wettability generated in the case of long-term storage, by suppressing formation of an oxide film.SOLUTION: A surface treatment substrate has successively from the substrate side on th...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
16.11.2015
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a surface treatment substrate capable of suppressing effectively decline of solder wettability generated in the case of long-term storage, by suppressing formation of an oxide film.SOLUTION: A surface treatment substrate has successively from the substrate side on the surface of the substrate, a nickel plating layer containing sulfur atoms as much as 0.01-0.13 wt%, and a treatment film comprising a treatment agent having a hydrophobic group and a hydrophilic group.
【課題】酸化皮膜の形成を抑制することで、長期保管した場合における、はんだ濡れ性の低下を有効に抑制することができる表面処理基材を提供すること。【解決手段】本発明によれば、基材の表面に、基材側から順に、硫黄原子を0.01〜0.13重量%で含有するニッケルめっき層と、疎水基および親水基を有する処理剤からなる処理皮膜とを有することを特徴とする表面処理基材を提供する。【選択図】図1 |
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Bibliography: | Application Number: JP20140081648 |