ELECTROSTATIC CHUCK
PROBLEM TO BE SOLVED: To provide an electrostatic chuck that can reduce damage which adhesive agent undergoes from plasma.SOLUTION: An electrostatic chuck has a ceramic dielectric substrate having a first primary face on which an adsorption target object is mounted, a second principal face at the op...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
05.11.2015
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide an electrostatic chuck that can reduce damage which adhesive agent undergoes from plasma.SOLUTION: An electrostatic chuck has a ceramic dielectric substrate having a first primary face on which an adsorption target object is mounted, a second principal face at the opposite side to the first principal face and a through-hole provided to extend from the second principal face to the first principal face, a metal base plate which supports the ceramic dielectric substrate and has a gas introducing path intercommunicating with the through-hole, and a joint layer which is provided between the ceramic dielectric substrate and the base plate and contains resin material. The joint layer has a space which is provided between the opening portion of the through-hole of the second principal face and the gas introducing path, and larger in a horizontal direction than the opening portion. A first area in which the end face of the joint layer at the space side intersects the second principal face farther retracts from the opening portion than another second area of the end face which is different from the first area.
【課題】プラズマにより接着剤が受けるダメージを低減することができる静電チャックを提供することを目的とする。【解決手段】吸着の対象物を載置する第1主面と、第1主面とは反対側の第2主面と、第2主面から第1主面にかけて設けられた貫通孔と、を有するセラミック誘電体基板と、セラミック誘電体基板を支持し、貫通孔と連通するガス導入路を有する金属製のベースプレートと、セラミック誘電体基板とベースプレートとの間に設けられ樹脂材料を含む接合層と、を備え、接合層は、第2主面における貫通孔の開口部と、ガス導入路と、の間に設けられ開口部よりも水平方向に大きい空間を有し、空間の側の接合層の端面が第2主面と交わる第1の領域は、第1の領域とは異なる端面の他の第2の領域よりも開口部から後退したことを特徴とする静電チャックが提供される。【選択図】図2 |
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Bibliography: | Application Number: JP20140262592 |