POSITIONAL DEVIATION DETECTION METHOD, POSITIONAL DEVIATION DETECTION DEVICE, DRAWING DEVICE AND SUBSTRATE EXAMINATION DEVICE

• Main Author: NAKAI KAZUHIRO
• Format: Patent
• Language: English; Japanese
• Published: 22.10.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PROBLEM TO BE SOLVED: To provide a positional deviation detection technology capable of accurately calculating a rotational positional deviation amount relative to a reference direction of a surface of a substrate that is positioned in such a manner that a notch provided in an outer peripheral part is turned in the reference direction, and to perform high-accuracy drawing processing or accurate substrate examination while using the positional deviation detection technology.SOLUTION: A positional deviation detection method includes: a first step of acquiring a partial image of a surface of a substrate; a second step of acquiring a plurality of patterns included in the partial image; a third step of selecting a plurality of pattern couples from among the plurality of patterns and calculating a plurality of equal pitch couples for which distances between patterns are equal to each other, from among the plurality of pattern couples; a fourth step of calculating rotational angles of two patterns relative to the reference direction on the basis of positional information of the two patterns forming the equal pitch couple for each equal pitch couple; and a fifth step of calculating a rotational positional deviation amount from the plurality of rotational angles calculated in the fourth step. 【課題】外周部に設けられた切欠部が基準方向を向くように位置決めされた、基板の表面の基準方向に対する回転位置ずれ量を正確に求めることができる位置ずれ検出技術、ならびに当該位置ずれ検出技術を用いて高精度な描画処理や正確な基板検査を行う。【解決手段】基板の表面の部分画像を取得する第１工程と、部分画像に含まれる複数のパターンを取得する第２工程と、複数のパターンからパターン対を複数個選定し、複数のパターン対のうちパターン間の距離が互いに等しい複数の等ピッチ対を求める第３工程と、等ピッチ対毎に、当該等ピッチ対を構成する２つのパターンの位置情報に基づいて基準方向に対する２つのパターンの回転角を求める第４工程と、第４工程で求められた複数の回転角から回転位置ずれ量を求める第５工程とを備える。【選択図】図７