HIGH INSULATION FILM AND FILM CAPACITOR USING THE SAME

• Main Author: MAEDA KAZUTAKA
• Format: Patent
• Language: English; Japanese
• Published: 22.10.2015
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; BASIC ELECTRIC ELEMENTS; CABLES; CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE; CHEMISTRY; COMPOSITIONS BASED THEREON; CONDUCTORS; ELECTRICITY; GENERAL PROCESSES OF COMPOUNDING; INSULATORS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

PROBLEM TO BE SOLVED: To provide a high insulation film excellent in heat resistance and high in dielectric strength, and to provide a film capacitor using the same.SOLUTION: Provided is a high insulation film essentially consisting of a resin, the resin is made of an amorphous resin, and further, provided that the minimum value of the refraction factor in the surface direction of the high insulation film is defined as Ny and the refraction factor in a direction orthogonal to the Ny in the surface direction of the high insulation film is defined as Nx and the thickness of the high insulation film is defined as d, the retardation (R) represented by the following formula 1 is 10 nm or lower: R=(Nx-Ny) d(the formula 1). 【課題】耐熱性に優れ、絶縁破壊強さが高い高絶縁性フィルムおよびそれを用いたフィルムコンデンサを提供する。【解決手段】樹脂を主成分とする高絶縁性フィルムであって、前記樹脂が非晶性樹脂であるとともに、前記高絶縁性フィルムの面方向における屈折率の最小値をＮｙとし、前記高絶縁性フィルムの面方向において前記Ｎｙに直交する方向の屈折率をＮｘとし、前記高絶縁性フィルムの厚さをｄとしたとき、下記式１で表されるレターデーション（Ｒ）が、１０ｎｍ以下である。Ｒ＝（Ｎｘ−Ｎｙ）・ｄ（式１）【選択図】なし