SUBSTRATE MATRIX TO DECOUPLE TOOL AND PROCESS EFFECTS

• Main Authors: DANIEL KANDEL, PAVEL IZIKSON, MICHAEL E ADEL
• Format: Patent
• Language: English; Japanese
• Published: 15.10.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To solve the problem of a method of measuring and analyzing test substrates sometimes suffering from an undesirable confounding of correlations between parameters and measured properties, which confounding tends to reduce accuracy in the correlations between the parameters and the properties; and provide techniques of determining and accounting for a source of the confounding.SOLUTION: A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix, specifying an eccentricity for the test matrix, selecting test structures to be created in cells on a substrate, processing the substrate through the process using in each cell the value of the parameter as determined by the eccentric test matrix, measuring a property of the test structures in the cells, and developing a correlation between the parameter and the property. 【課題】テスト基板を測定して解析するこの方法は、パラメータと計測された特性との間の相関にかかる不所望な交絡に悩まされることがあり、この交絡はパラメータと特性との間の相関の精度を減少させる傾向がある。交絡の原因を究明して計上する技術を提供する。【解決手段】特徴付けすべきプロセスを選択し、特徴付けすべきプロセスのパラメータを選択し、テストマトリクスで使用するパラメータの値を決定し、テストマトリクスの偏心度を特定し、基板上のセル内に作成すべきテスト構造を選択し、プロセスを通じて、偏心テストマトリクスにより決定されるような、パラメータの値を、各セルに用いて基板を処理し、セル内のテスト構造の特性を計測し、パラメータと特性との間の相関を展開することにより、プロセスを特徴付ける。【選択図】図３