ETCHING LIQUID CAPABLE OF REDUCING GALVANIC EFFECT EFFECTIVELY

• Main Authors: HSU SU-FEI, TSAI JENG-YING, LIAO CHENG-KAI
• Format: Patent
• Language: English; Japanese
• Published: 07.09.2015
• Subjects: BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an etching liquid capable of reducing the galvanic effect effectively.SOLUTION: An etching liquid is prepared by dissolving an etching liquid and a nitrogen-containing five-membered heterocyclic compound in water in a specified ratio. When a user subjects a substrate containing an at least one first metal, e.g. gold, and an at least one second metal, e.g. copper, to wet etching with the etching liquid, the nitrogen-containing five-membered heterocyclic compound forms an organic coating on the first metal high in reduction potential, leading to prevention of an excessive etching phenomenon of the second metal owing to the galvanic effect. 【課題】有効にガルバノ効果を軽減できるエッチング液を提供すること。【解決手段】主に特定比例のエッチング液と含窒素５員複素環化合物とを水に溶かして、エッチング液を調合する。使用者がこのエッチング液を少なくとも一つの第１金属（例えば、金）と少なくとも一つの第２金属（例えば、銅）を含む基板にウェットエッチングを行った後に、含窒素５員複素環化合物が高い還元電位を有する第１金属の上に有機被膜を形成することによって、第２金属がガルバノ効果（ｇａｌｖａｎｉｃ ｅｆｆｅｃｔ）の影響により、過度なエッチング現象を防げる。【選択図】なし