CORRECTING BIASED DIAMETER SIZE VARIATIONS IN APERTURE ARRAY

PROBLEM TO BE SOLVED: To provide a method of creating an imaging mask which avoids variations in apertures in a nozzle plate, the method solving the problem in which, although apertures in an imaging mask have uniform diameters, variations in the positions of the apertures in the nozzle plate formed...

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Bibliographic Details
Main Authors ANDREWS JOHN R, STEPHENS TERRANCE L, RUANDER CARDENAS
Format Patent
LanguageEnglish
Japanese
Published 13.08.2015
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Summary:PROBLEM TO BE SOLVED: To provide a method of creating an imaging mask which avoids variations in apertures in a nozzle plate, the method solving the problem in which, although apertures in an imaging mask have uniform diameters, variations in the positions of the apertures in the nozzle plate formed by the mask cause variations in dimensions of the apertures in the nozzle plate resulting in deterioration of print quality.SOLUTION: A method includes characterizing variations in aperture 16 size in an array of apertures in a nozzle plate, obtaining a transfer function that relates mask aperture 20 size to a final ablated aperture 16 size, and using the transfer function to create a modified imaging mask 18. 【課題】画像形成マスク内の開口の直径は均一であるにも関わらず、マスクにより形成されるノズルプレート上の開口の位置が様々なため、ノズルプレート上の開口の寸法がばらつき、印刷品質を悪くしていた。そこで、ノズルプレート上の開口がばらつかない、画像形成マスクの作成方法を提供する。【解決手段】ノズルプレートの開口アレイ内の開口16のサイズのばらつきを特徴付けるステップと、マスク開口20のサイズを最終的に切除される開口16のサイズに関連付ける伝達関数を得るステップと、その伝達関数を用いて、修正された画像形成マスク18を作成するステップとが含まれる。【選択図】図1
Bibliography:Application Number: JP20150010575