LOAD PORT DEVICE

• Main Authors: EMOTO ATSUSHI, IWAMOTO TADAMASA
• Format: Patent
• Language: English; Japanese
• Published: 03.08.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To prevent an increase in partial pressure of oxidizing gas with time elapse inside a FOUP (Front-Opening Unified Pod) which is fixed to a FIMS (Front-Opening Interface Mechanical Standard) system and put in an open state.SOLUTION: A gas supply port is arranged on a lower surface of a FOUP, and in addition to nitrogen purge from a pod opening, nitrogen supply to the inside of the FOUP is enabled via a gas supply port in a state where a pod is placed in a FIMS. A nitrogen supply system for supplying nitrogen in a state where the FOUP is placed is controlled so that nitrogen is supplied at a low flow rate and a low pressure capable of inhibiting dust or the like in size which may cause a problem from being blown up from the gas supply port or the like in wiring formed in a wafer. 【課題】FIMSシステムに固定されて開放状態にあるFOUP内部の酸化性ガスの分圧が時間の経過と共に増加することを防止する。【解決手段】FOUP下面にガス供給ポートを配し、ポッド開口からの窒素パージに加え、FIMSにポッドが載置された状態で該ガス供給ポートを介してFOUP内部への窒素供給を可能とする。FOUP載置状態において窒素供給を行なう窒素供給系は、ウエハに形成する配線において問題を生じ得るサイズの塵等のガス供給ポート等よりの巻上げを抑制し得る低流量、低圧での窒素供給を行なうように制御される。【選択図】図１