MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR PROJECTION LENS

• Main Authors: MALLMANN JOERG, WEGMANN ULRICH, EHRMANN ALBRECHT, SCHUSTER KARL HEINZ, HOCH RAINER
• Format: Patent
• Language: English; Japanese
• Published: 27.07.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To improve a projection exposure apparatus such that imaging defects resulting from inhomogeneities of the refractive index within the immersion liquid are reduced.SOLUTION: A microlithographic projection exposure apparatus includes a projection lens (20) that is configured for immersion operation. For this purpose an immersion liquid (34) is introduced into an immersion space (44) that is located between a last lens (L5;54) of the projection lens (20) on the image side and a photosensitive layer (26) to be exposed. To reduce fluctuations in refractive index resulting from temperature gradients occurring within the immersion liquid (34), the projection exposure apparatus (10) includes heat transfer elements (50;501;502;503;504) that heat or cool partial volumes of the immersion liquid (34) in a prescribed manner. 【課題】液浸液内部の屈折率の不均一から生じる結像欠陥が低減されるように、投影露光装置を改良すること。【解決手段】マイクロリソグラフィ投影露光装置は、液浸動作のために構成されている投影レンズ（２０）を含む。この目的で、液浸液（３４）が、像側の投影レンズ（２０）の最終レンズ（Ｌ５；５４）と露光される感光層（２６）との間に位置する液浸空間（４４）に導入される。液浸液（３４）内で生じる温度勾配に起因する屈折率の変動を低減するために、投影露光装置（１０）は伝熱要素（５０；５０１；５０２；５０３；５０４）を含み、それにより液浸液（３４）の区域は指定の様態で加熱または冷却される。【選択図】図３