COATING COMPOSITIONS FOR USE WITH OVERCOATED PHOTORESIST

PROBLEM TO BE SOLVED: To provide coating compositions as an undercoat of an overcoated photoresist useful for mitigating deterioration in resolution of patterned images caused by reflection of activating radiation used to expose the photoresist.SOLUTION: An undercoating composition comprises a resin...

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Bibliographic Details
Main Authors KONG LIU, ONGAYI OWENDI, WAYTON GERALD B, JAIN VIPUL, COLEY SUZANNE, ZAMPINI ANTHONY
Format Patent
LanguageEnglish
Japanese
Published 27.07.2015
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Summary:PROBLEM TO BE SOLVED: To provide coating compositions as an undercoat of an overcoated photoresist useful for mitigating deterioration in resolution of patterned images caused by reflection of activating radiation used to expose the photoresist.SOLUTION: An undercoating composition comprises a resin containing cyanurate groups and hydrophobic groups originating from a compound represented by the formula (I). The undercoating composition can enhance resolution of an overcoated photoresist relief image. 【課題】フォトレジストを露光するのに使用される活性化放射線の反射によるパターン形成される像の解像度の低下を減らすために有用な上塗りフォトレジストの下地としてコーティング組成物の提供。【解決手段】式(I)で表わされる化合物に由来するシアヌラート基及び疎水性基を含む樹脂を含有する下地コーティング組成物。当該コーティング組成物は上塗りフォトレジストレリーフ像の解像度を向上させることができる下地コーティング組成物。【選択図】なし
Bibliography:Application Number: JP20150035100