RADICAL SOURCE

• Main Authors: YAMAKAWA KOJI, DEN SHOJI, KANO HIROYUKI, HORI MASARU
• Format: Patent
• Language: English; Japanese
• Published: 11.06.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a radical source capable of generating high-density radicals.SOLUTION: A radical source includes a gas supply tube 10 comprising SUS and a cylindrical plasma generation tube 11 connected to the gas supplying tube 10 and comprising pyrolytic boron nitride (PBN). The radical source has a cylindrical CCP electrode (capacity coupling plasma) 13 arranged on the outer side of the plasma generating tube 11, and a coil 12 wound along the outer circumference of the plasma generating tube 11, on the downstream side of the CCP electrode 13. A plurality of permanent magnets 14 are installed in a hollow part of the CCP electrode 13, and CCP is unevenly distributed at a center part of the plasma generating tube 11 by a cusp magnetic field caused by the permanent magnets 14. 【課題】高密度なラジカルを生成することが可能なラジカル源の提供。【解決手段】ラジカル源は、ＳＵＳからなる気体供給管１０と、気体供給管１０に接続する熱分解窒化ホウ素（ＰＢＮ）からなる円筒状のプラズマ生成管１１を有している。プラズマ生成管１１の外側には、円筒形のＣＣＰ（容量結合プラズマ）電極１３が配置されていて、ＣＣＰ電極１３よりも下流側には、プラズマ生成管１１の外周に沿って巻かれたコイル１２を有している。ＣＣＰ電極１３の中空部には複数の永久磁石１４が配設され、複数の永久磁石１４によるカスプ磁場によりプラズマ生成管１１の中心部にＣＣＰを偏在させる。【選択図】図１