METHOD FOR MANUFACTURING LIQUID CRYSTAL ELEMENT

• Main Authors: IDE MASASHI, NOZAKI TAKAAKI, TAKEISHI TAKAAKI, KIMURA KENICHIRO, YODA KAORU
• Format: Patent
• Language: English; Japanese
• Published: 28.05.2015
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PROBLEM TO BE SOLVED: To provide a liquid crystal element that has durability even in a high temperature and high humidity environment and is applicable to an optical communication device, and a method for manufacturing a liquid crystal element.SOLUTION: The method for manufacturing a liquid crystal element includes: a step of forming an inorganic spacer material (33) and a gold film (35) into a frame shape on a first substrate (11); a step of forming an alignment layer (13) on the first substrate including the frame-shaped inorganic spacer material and the gold film; a step of removing the alignment layer formed on the gold film on the first substrate; a step of stacking and disposing an inorganic spacer material (37) and a gold film (36) into a frame shape on a second substrate (21); a pressure-bonding step of laminating, pressurizing and bonding the gold film where a structure is formed on the first substrate with the gold film on the second substrate; and a step of disposing a liquid crystal (41) between the first substrate and the second substrate. 【課題】高温高湿の環境にあっても耐久性のある、光通信のデバイスにも適用可能な、液晶素子および液晶素子の製造方法を提供すること。【解決手段】第１の基板(11)上の無機スペーサ材(33)及び金膜(35)を枠状に形成する工程と、枠状の無機スペーサ材及び金膜を含む第１の基板上に配向膜(13)を形成する工程と、第１の基板上の金膜の上に形成された配向膜を除去する工程と、第２の基板(21)上に無機スペーサ材(37)及び金膜(36)を重ねて枠状に配置する工程と、第１の基板上の構造物が形成された金膜と第２の基板上の金膜とを重ね合わせ、加圧して接合する加圧接合工程と、第１の基板と第２の基板の間に液晶(41)を配置する工程とを備える液晶素子の製造方法。【選択図】図１１