OPTICAL FILTER AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To obtain an optical filter having little incident angle dependency.SOLUTION: The optical filter comprises a substrate 10 made of SiOand a layered structure including a first layer 11a made of Si, a second layer 12 made of SiO, a first layer 11b made of Si, and a third layer 13...

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Bibliographic Details
Main Authors ARIKI TOMOHIDE, TACHINO YOSHIHIDE, DAIMON MAKOTO, SUGIURA MAKIKO, YOGO YUKIAKI, FUJIKAWA HISAYOSHI
Format Patent
LanguageEnglish
Japanese
Published 28.05.2015
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To obtain an optical filter having little incident angle dependency.SOLUTION: The optical filter comprises a substrate 10 made of SiOand a layered structure including a first layer 11a made of Si, a second layer 12 made of SiO, a first layer 11b made of Si, and a third layer 13 made of SiOsuccessively deposited in this order on the substrate 10. The optical filter functions as a band-pass filter transmitting light at a designed wavelength λ(=870 nm) and a designed incident angle (=50°) by interference caused by the layered structure. The first layers 11a, 11b are made of Si that absorbs a short wavelength side of a wavelength near the designed wavelength λ. The first layers 11a, 11b have film thickness of 210 nm, and the second layer has film thickness of 180 nm. 【課題】入射角依存性が小さな光学フィルタを実現すること。【解決手段】光学フィルタは、ＳｉＯ2からなる基板１０と、基板１０上にＳｉからなる第１層１１ａ、ｂ、ＳｉＯ2からなる第２層１２、Ｓｉからなる第１層１１ｂ、ＳｉＯ2からなる第３層１３の順に積層された積層構造と、を有している。光学フィルタは、その積層構造による干渉によって設計波長λ（＝８７０ｎｍ）、設計入射角度 （＝５０?）の光を透過するバンドパスフィルタとして動作する。第１層１１ａ、ｂは、設計波長λ近傍のある波長よりも短波長側を吸収する材料であるＳｉからなる。第１層１１ａ、ｂの膜厚は２１０ｎｍであり、第２層の膜厚は１８０ｎｍである。【選択図】図１
Bibliography:Application Number: JP20130239564