PLATE-LIKE BODY POLISHING DEVICE, PLATE-LIKE BODY POLISHING METHOD, AND PLATE-LIKE BODY MANUFACTURING METHOD

• Main Authors: KAWACHI TATSURO, ISHIMARU NAOHIKO, SHIROYAMA ATSUSHI
• Format: Patent
• Language: English; Japanese
• Published: 28.05.2015
• Subjects: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GLASS; GRINDING; JOINING GLASS TO GLASS OR OTHER MATERIALS; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; METALLURGY; MINERAL OR SLAG WOOL; PERFORMING OPERATIONS; POLISHING; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a plate-like body polishing device, a plate-like body polishing method, and a plate-like body manufacturing method capable of equalizing variations in unevenness of polishing lines locally generated on a surface of a plate-like body to improve flatness over an entire surface of the plate-like body.SOLUTION: Polishing tools 22 of a polishing device 20 are configured to be a diameter D1 smaller than a width W of a glass plate G, and polish a surface of the glass plate G while being rotated and revolved. The polishing tools 22 are disposed to be a pair relative to a movement center line L of the glass plate G and disposed zigzag to be shifted along a movement direction, and each of the polishing tools 22 crosses the movement center line L to polish the glass plate G. A pair of the polishing tools 22 is configured to be a polishing tool unit 24. Positions of revolution axes P4 of polishing tools 22A, 22B of a polishing tool unit 24A at a rearmost row are shifted to a position of a revolution axis P4 of each of the polishing tools 22, 22 of the other polishing tool unit 24 to the movement direction of the glass plate G. 【課題】本発明は、板状体の表面に局所的に発生する研磨筋の凹凸のばらつきを均一化させて、板状体の表面全面における平坦度を向上させる板状体の研磨装置、板状体の研磨方法、及び板状体の製造方法を提供する。【解決手段】研磨装置２０の研磨具２２は、ガラス板Ｇの幅Ｗよりも小さい直径Ｄ１で構成され、自転され、かつ公転されながらガラス板Ｇの表面を研磨する。研磨具２２は、ガラス板Ｇの移動中心線Ｌを基準として対を成して配置され、移動方向に沿って位置をずらした千鳥状に配置され、各々の研磨具２２が移動中心線Ｌを越えてガラス板Ｇを研磨する。対を成す一対の研磨具２２が研磨具ユニット２４として構成される。最後列の研磨具ユニット２４Ａの研磨具２２Ａ、２２Ｂの公転軸Ｐ４の位置が、ガラス板Ｇの移動方向に対する他の研磨具ユニット２４の各研磨具２２、２２の公転軸Ｐ４の位置に対してずらされる。【選択図】図１