CONTROL OF IMPEDANCE OF RF DELIVERY PATH

• Main Authors: LUC ALBAREDE, RAJINDER DHINDSA, KEN LUCCHESI, ALEXEI MARAKHTANOV
• Format: Patent
• Language: English; Japanese
• Published: 21.05.2015
• Subjects: BASIC ELECTRIC ELEMENTS; BASIC ELECTRONIC CIRCUITRY; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; RESONATORS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide control of the impedance of an RF transmission path to obtain uniformity of plasma etching or depositing.SOLUTION: A plasma system includes: an RF generator 225; a matchbox 208 including an impedance matching circuit, which is coupled to the RF generator 225 via an RF cable 212A; a plasma reactor 214 including a chuck (lower electrode) 224, coupled to the matchbox 208 via an RF line (RF rod) 216A; a phase adjusting circuit (filter) 218 coupled to an RF supply path 220 between the impedance matching circuit and the chuck 224, where the phase adjusting circuit 218 has a first end coupled to the RF supply path 220 and a second end 270B that is grounded; and a controller coupled to the phase adjusting circuit 218 and used for changing a parameter of the phase adjusting circuit 218 to control the impedance of the RF supply path 220 on the basis of a tune recipe. 【課題】プラズマエッチング又は蒸着の均一性を得るためのＲＦ伝送路のインピーダンスの制御を提供する。【解決手段】ＲＦ発生器２２５と、ＲＦケーブル２１２Ａを通じてＲＦ発生器２２５に結合されたインピーダンス整合回路を含む整合ボックス２０８と、ＲＦ線路（ＲＦロッド）２１６Ａを通じて整合ボックス２０８に結合された、チャック（下部電極）２２４を含むプラズマリアクタ２１４であって、プラズマリアクタ２１４と、前記インピーダンス整合回路とチャック２２４との間でＲＦ供給路２２０に結合された位相調整回路（フィルタ）２１８であって、ＲＦ供給路２２０に結合された第１の端と、接地された第２の端２７０Ｂとを有する位相調整回路２１８と、位相調整回路２１８に結合され、調節レシピに基づいて位相調整回路２１８のパラメータを変化させてＲＦ供給路２２０のインピーダンスを制御するためのコントローラと、を備える。【選択図】図４Ａ