LAMINATE, ORGANIC-SEMICONDUCTOR MANUFACTURING KIT, AND RESIST COMPOSITION FOR MANUFACTURING ORGANIC SEMICONDUCTOR

• Main Authors: KAMOCHI YOSHITAKA, IWAI HISASHI, KOYAMA ICHIRO, MIZUTANI KAZUYOSHI
• Format: Patent
• Language: English; Japanese
• Published: 07.05.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TRANSPORTING

PROBLEM TO BE SOLVED: To provide: a laminate that allows the formation of a good organic semiconductor pattern; an organic-semiconductor manufacturing kit for manufacturing the laminate; and a resist composition for manufacturing an organic semiconductor, the resist composition being used in the organic-semiconductor manufacturing kit.SOLUTION: This laminate comprises an organic semiconductor film, a protective film on top of the organic semiconductor film, and a resist film on top of the protective film. The resist film comprises a photosensitive resin composition that contains a photoradical polymerization initiator (A) and a radical-polymerizable compound (B). 【課題】本発明は、良好な有機半導体パターンを形成可能な積層体、およびかかる積層体を製造するための、有機半導体製造用キット、ならびに、有機半導体製造用キットに用いる有機半導体製造用レジスト組成物を提供することを目的とする。【解決手段】有機半導体膜と、上記有機半導体膜上の保護膜と、上記保護膜上のレジスト膜を有し、上記レジスト膜が、光ラジカル重合開始剤（Ａ）およびラジカル重合性化合物（Ｂ）を含む感光性樹脂組成物からなる積層体。【選択図】なし