EXPOSURE EQUIPMENT

PROBLEM TO BE SOLVED: To provide exposure equipment which can prevent a temperature fluctuation in a projection optical system caused by exposure heat and keep stable image performance.SOLUTION: An exposure light path space (5) in a projection optical system comprises optical measurement means (13)...

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Bibliographic Details
Main Author SEKINE HIROKAZU
Format Patent
LanguageEnglish
Japanese
Published 23.04.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide exposure equipment which can prevent a temperature fluctuation in a projection optical system caused by exposure heat and keep stable image performance.SOLUTION: An exposure light path space (5) in a projection optical system comprises optical measurement means (13) and calculation means (12) calculating a temperature fluctuation in the exposure light path space (5) from a waveform of the measurement result. Based on the calculation result, temperature control air (16) adjusted to an appointed temperature is supplied into the projection optical system by temperature control means (11). 【課題】露光熱による投影光学系内の温度ゆらぎを防ぎ，安定した像性能を維持することのできる露光装置を提供すること。【解決手段】投影光学系内の露光光路空間（５）に光学計測手段（１３）と，前記計測結果の波形から露光光路空間（５）内の温度ゆらぎを算出する算出手段（１２）を備える。前記算出結果に基づいて，温調手段（１１）により所定の温度に調整された温調エア（１６）を投影光学系内に供給する。【選択図】 図１
Bibliography:Application Number: JP20130215198