PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF RESIN PATTERN, AND DISPLAY DEVICE

• Main Authors: SAIJO HIDEKI, KATANO AKIRA
• Format: Patent
• Language: English; Japanese
• Published: 13.04.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition from which a resin pattern having a normally tapered opening can be easily formed, a production method of a resin pattern using the photosensitive resin composition, and a display device including a resin pattern produced by the above production method.SOLUTION: The photosensitive resin composition comprises (A) an alkali-soluble resin, (B) a photopolymerization initiator, and (C) a photopolymerizable compound. The (C) photopolymerizable compound contains a monofunctional monomer that shows a glass transition temperature of -10°C or lower when the monomer is prepared into a homopolymer having a mass average molecular weight of 10000 or more. 【課題】順テーパー形状の開口部を有する樹脂パターンを容易に形成可能なネガ型の感光性樹脂組成物、その感光性樹脂組成物を用いた樹脂パターンの製造方法、及びその製造方法によって製造された樹脂パターンを備える表示装置を提供する。【解決手段】本発明に係る感光性樹脂組成物は、（Ａ）アルカリ可溶性樹脂、（Ｂ）光重合開始剤、及び（Ｃ）光重合性化合物を含有し、上記（Ｃ）光重合性化合物が、質量平均分子量１００００以上のホモポリマーとしたときのガラス転移温度が−１０℃以下となる単官能モノマーを含む。【選択図】なし