EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CHAMBER DEVICE USED IN THE DEVICE

• Main Authors: FUJIMOTO JUNICHI, WAKABAYASHI OSAMU, NISHISAKA TOSHIHIRO
• Format: Patent
• Language: English; Japanese
• Published: 19.03.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES; X-RAY TECHNIQUE

PROBLEM TO BE SOLVED: To provide a chamber device capable of optimizing an attitude control mechanism for adjusting positions or inclinations of components in a chamber.SOLUTION: A chamber device for producing extreme ultraviolet light, comprises: a chamber having a wall part having a first through-hole provided therein, in which EUV light is produced; an EUV collector mirror disposed in the chamber; an attitude control mechanism disposed outside the chamber, for controlling the attitude of the EUV collector mirror; a support part connecting between the EUV collector mirror and the attitude control mechanism via the first through hole; a flange disposed so as to cover the first through hole, and having at least one second through hole; and an extension pipe having one end fixed to the circumference of the at least one second through hole and the other end fixed to the support part, and maintaining sealing of the interior of the chamber by surrounding at least a part of a side face of the support part. 【課題】チャンバ内において構成部品の位置又は傾きを調整するための姿勢制御機構を最適化する。【解決手段】極端紫外光を生成するチャンバ装置は、壁部に第１の貫通孔が設けられ、内部でＥＵＶ光の生成が行われるチャンバと、チャンバ内に配置されるＥＵＶ集光ミラーと、チャンバ外に配置され、ＥＵＶ集光ミラーの姿勢を制御する姿勢制御機構と、第１の貫通孔を介してＥＵＶ集光ミラーと姿勢制御機構とを接続する支持部と、第１の貫通孔を覆うように設けられ、少なくとも１つの第２の貫通孔を有するフランジと、少なくとも１つの第２の貫通孔の周囲に固定された一端と、支持部に固定された他端とを有し、支持部の側面の少なくとも一部を囲んでチャンバ内の密閉を維持する伸縮管と、を備えても良い。【選択図】図１