PLASMONIC INTERFACE AND METHOD OF MANUFACTURING THE SAME

• Main Authors: BECERRA JUAN JOSE, KEIMEL CHRISTOPHER FRED, JOHN BRIAN HEWGLEY
• Format: Patent
• Language: English; Japanese
• Published: 02.03.2015
• Subjects: OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS

PROBLEM TO BE SOLVED: To provide a material stack that provides excellent performance in generating near-field light and optimal efficiency in conversion of light energy in a plasmonic material.SOLUTION: The method includes providing a substrate layer, disposing 34 a layer of a plasmonic material on the substrate layer, depositing 36 a metal constituent of an optical waveguide material directly onto the layer of the plasmonic material, and anodizing the metal constituent of the optical waveguide material to form 38 an optically transparent oxide of the metal constituent configured to couple light into the layer of the plasmonic material, with the optically transparent oxide of the metal constituent forming an optical waveguide structure. 【課題】近接場光の生成性能に優れ、かつプラズモン材料において光エネルギーを最適な効率で変換する材料積層体を提供する。【解決手段】基板層を用意する工程と、基板層の上にプラズモン材料の層を配置する工程３４と、光導波路材料の金属成分をプラズモン材料の層の上に直接堆積させる工程３６と、光導波路材料の金属成分を陽極酸化して、プラズモン材料の層に光を結合する、金属成分の光学的に透明な酸化物を形成する工程３８とを含み、金属成分の光学的に透明な酸化物は光導波路構造を形成する。【選択図】図４