COMPOSITION FOR FILM FORMATION AND FILM THEREOF, AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT USING THE SAME

• Main Authors: TERUI TAKAAKI, KOMORIYA HARUHIKO, HARA YUKARI, KOBAYASHI FUMITO, HARA IKUNARI
• Format: Patent
• Language: English; Japanese
• Published: 26.02.2015
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a composition for film formation which can form a fluororesin film on an organic semiconductor film, and has resistance to an etching solvent when a precise pattern of an organic semiconductor is obtained in photolithography or the like, and a film thereof; and a method for manufacturing an organic semiconductor element using the same.SOLUTION: A composition for film formation contains a fluororesin which is a copolymer of a fluorine monomer and vinyl ether and has a structure represented by the formula (1), and a fluorine solvent. 【課題】有機半導体膜上にフッ素樹脂膜の形成が可能であって、フォトリソグラフィー等において有機半導体の精緻なパターンを得る際に、エッチング溶剤に耐性がある膜形成用組成物およびその膜、並びにそれを用いた有機半導体素子の製造方法を提供する。【解決手段】式（１）で表される構造を導く、フッ素系モノマーとビニルエーテルとの共重合体であるフッ素系樹脂とフッ素系溶剤とを含む、膜形成用組成物。【選択図】図１