DEVELOPMENT APPARATUS, DEVELOPMENT METHOD AND STORAGE MEDIUM

• Main Authors: KYODA HIDEJI, TAKIGUCHI YASUSHI, MUTA KOSHI, YOSHIHARA KOSUKE, YAMAMOTO TARO
• Format: Patent
• Language: English; Japanese
• Published: 16.02.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a technique for enhancing the uniformity of the line width of a resist pattern in the plane of a substrate, when developing a substrate subjected to exposure.SOLUTION: A development apparatus is constituted to include a substrate holding section for holding a substra...