ELECTROLESS NICKEL PLATING SOLUTION AND ELECTROLESS NICKEL PLATING METHOD USING THE SAME

• Main Author: KURODA SHOHEI
• Format: Patent
• Language: English; Japanese
• Published: 16.02.2015
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To improve stability of an electroless nickel plating solution containing vanadic acid, molybdic acid and a hydroxycarboxylic acid.SOLUTION: An electroless nickel plating solution contains at least one stabilizer selected from vanadate ion(VO) and molybdate ion(MoO), iodate ion(IO) as a strong oxidant, nickel ion, a hydroxycarboxylic acid and a nickel ion reductant. When the electroless nickel plating solution contains vanadate ion(VO) as a stabilizer, the concentration of iodate ion(IO) is preferably 0.25-10 times the concentration of vanadate ion(VO) to obtain a higher effect. 【課題】バナジン酸やモリブデン酸とヒドロキシカルボン酸とを含有する無電解ニッケルめっき液の安定性を改善すること。【解決手段】バナジン酸イオン（ＶＯ３−）及びモリブデン酸イオン（ＭｏＯ４２−）から選択される少なくとも１種の安定剤と、強酸化剤であるヨウ素酸イオン（ＩＯ３−）と、ニッケルイオンと、ヒドロキシカルボン酸と、ニッケルイオン還元剤とを含有することを特徴とする無電解ニッケルめっき液である。安定剤としてバナジン酸イオン（ＶＯ３−）を含有する場合、バナジン酸イオン（ＶＯ３−）濃度の０．２５倍〜１０倍のヨウ素酸イオン（ＩＯ３−）濃度とすれば、より高い効果が得られる。【選択図】なし