INTERFERENCE FILTER, OPTICAL FILTER DEVICE, OPTICAL MODULE, ELECTRONIC EQUIPMENT, METHOD FOR MANUFACTURING INTERFERENCE FILTER, AND MEMS ELEMENT

PROBLEM TO BE SOLVED: To provide an interference filter capable of suppressing warpage of a substrate, an optical filter device, an optical module, electronic equipment, a method for manufacturing an interference filter, and a MEMS (micro-electro mechanical system) element.SOLUTION: A wavelength var...

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Bibliographic Details
Main Authors NISHIMURA AKIYUKI, SAKASHITA YUKI
Format Patent
LanguageEnglish
Japanese
Published 05.02.2015
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Summary:PROBLEM TO BE SOLVED: To provide an interference filter capable of suppressing warpage of a substrate, an optical filter device, an optical module, electronic equipment, a method for manufacturing an interference filter, and a MEMS (micro-electro mechanical system) element.SOLUTION: A wavelength variable interference filter 5 includes: a fixed substrate 51; a movable substrate 52 opposing to the fixed substrate 51; a pair of reflection films 54, 55; a fixed lead-out electrode 561A disposed on the fixed substrate 51; and a movable connection electrode 562B disposed on the movable substrate 52 and in contact with the fixed lead-out electrode 561A at a connection position. The movable substrate 52 has, in a plan view in a substrate thickness direction of the fixed substrate 51 and the movable substrate 52, a first groove 520 disposed at the connection position and a second groove 522 having an area larger than that of the first groove 520 in the plan view and connected to the first groove 520. 【課題】基板の撓みを抑制可能な干渉フィルター、光学フィルターデバイス、光学モジュール、電子機器、干渉フィルターの製造方法、及びMEMS素子を提供する。【解決手段】波長可変干渉フィルター5は、固定基板51と、固定基板51に対向する可動基板52と、一対の反射膜54,55と、固定基板51に設けられた固定引出電極561Aと、可動基板52に設けられ、接続位置において固定引出電極561Aに当接する可動接続電極562Bと、を備え、可動基板52は、固定基板51及び可動基板52を基板厚み方向から見た平面視において、接続位置に設けられた第一溝部520と、上記平面視において、第一溝部520よりも面積が大きく、かつ第一溝部520に連結された第二溝部522とを有する。【選択図】図2
Bibliography:Application Number: JP20130156420