PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE

• Main Authors: HIKITA MASANORI, SAKIDA KYOHEI, YUMOTO MASATOSHI
• Format: Patent
• Language: English; Japanese
• Published: 05.02.2015
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMISTRY; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; HETEROCYCLIC COMPOUNDS; METALLURGY; ORGANIC CHEMISTRY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an oxime sulfonate compound that gives a photosensitive resin composition having high sensitivity, excellent storage stability, excellent transparency of a cured film, and wide development latitude.SOLUTION: The oxime sulfonate compound is expressed by formula (2), formula (3) or formula (4) shown below. In formulae (2) to (4), Rrepresents an alkyl group, an aryl group or a heteroaryl group; Reach independently represents a hydrogen atom, an alkyl group, an aryl group or a halogen atom; Reach independently represents a halogen atom, alkyl group, alkyloxy group, sulfonate group, aminosulfonyl group or alkoxysulfonyl group; X represents O or S; n represents 1 or 2; m represents an integer of 0 to 6; and in two or more of Rpresent in the compound, at least one represents an alkyl group, an aryl group or a halogen atom. 【課題】高感度であり、保存安定性及び硬化膜の透明性に優れ、現像寛容度が広い感光性樹脂組成物が得られるオキシムスルホネート化合物を提供すること。【解決手段】下記式（２）、式（３）又は式（４）で表されることを特徴とするオキシムスルホネート化合物。式（２）〜式（４）中、Ｒ1はアルキル基、アリール基又はヘテロアリール基を表し、Ｒ2はそれぞれ独立に、水素原子、アルキル基、アリール基又はハロゲン原子を表し、Ｒ6はそれぞれ独立に、ハロゲン原子、アルキル基、アルキルオキシ基、スルホン酸基、アミノスルホニル基又はアルコキシスルホニル基を表し、ＸはＯ又はＳを表し、ｎは１又は２を表し、ｍは０〜６の整数を表す。ただし、化合物中に２以上存在するＲ2のうち、少なくとも１つはアルキル基、アリール基又はハロゲン原子である。【選択図】なし