VACUUM SINTERING PROCESS FACILITY

PROBLEM TO BE SOLVED: To provide a vacuum sintering process facility capable of efficiently performing sintering process with a compact device structure.SOLUTION: In a vacuum sintering process facility, a plurality of vacuum heating chambers 2A, 2B, 2C, 2D and a vertical lift 3 putting in and out a...

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Main Authors SHIBATA KEI, MATSUI KOJI, ISHIHAMA KATSUNORI, AKAO MASAMITSU, HORI TOORU, MARUYAMA TAKASHI
Format Patent
LanguageEnglish
Japanese
Published 02.02.2015
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Summary:PROBLEM TO BE SOLVED: To provide a vacuum sintering process facility capable of efficiently performing sintering process with a compact device structure.SOLUTION: In a vacuum sintering process facility, a plurality of vacuum heating chambers 2A, 2B, 2C, 2D and a vertical lift 3 putting in and out a work to and from the vacuum heating chambers are stored in a housing unit 1 whose one end is opened; a vacuum flange 11 is provided for airtightly connecting other housing units to the open part of the housing unit 1; and a gas cooling chamber 4 as the other housing unit is connected to the vacuum flange 11. The vacuum sintering process facility sets a temperature of each of the vacuum heating chambers 2A-2D to a temperature necessary for vacuum sintering process. 【課題】コンパクトな装置構造で効率よく焼結処理を行うことが可能な真空焼結処理設備を提供する。【解決手段】複数の真空加熱室2A,2B,2C,2Dとこれら真空加熱室内へワークを出し入れする垂直リフト3とを、一端が開放する筐体ユニット1内に収納し、筐体ユニット1の開放部に気密的に他の筐体ユニットを結合するための真空フランジ11を設けるとともに、真空フランジ11に他の筐体ユニットとしてガス冷却室4を結合した真空焼結処理設備であって、各真空加熱室2A〜2Dを真空焼結処理に必要な温度にそれぞれ設定する。【選択図】 図1
Bibliography:Application Number: JP20130148575