AROMATIC POLYACETALS AND ARTICLES COMPRISING THEM

• Main Authors: OBER MATTHIAS S, PULIKKOTTIL J THOMAS, ROMER DUANE R, JOHN B ETIENNE
• Format: Patent
• Language: English; Japanese
• Published: 02.02.2015
• Subjects: CHEMISTRY; COMPOSITIONS BASED THEREON; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide photoresists excellent in resolution, line width roughness, and sensitivity.SOLUTION: A polymer includes repeat units represented by the structural formula in the figure. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists. 【課題】解像度、線幅粗度、および感度の優れたフォトレジストの提供。【解決手段】下記構造式で表される繰り返し単位を含むポリマー。ポリマーはＳｕｚｕｋｉ重縮合によって調製され得る。ポリマー骨格におけるアセタール及び／又はケタール官能性により、酸において骨格が開裂可能になる。ポリマーはリソグラフィーフォトレジストを含む用途に有用である。【選択図】図１