ELECTRON GUN, AND ELECTRON MICROSCOPE

PROBLEM TO BE SOLVED: To provide an electron gun and an electron microscope, capable of improving observation efficiency (throughput) by making it easy to readjust the electron gun and an electron optical system, where the electron gun and the electron microscope are a field emission type electron g...

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Bibliographic Details
Main Authors ONISHI TAKASHI, WATANABE SHUNICHI
Format Patent
LanguageEnglish
Japanese
Published 22.01.2015
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Summary:PROBLEM TO BE SOLVED: To provide an electron gun and an electron microscope, capable of improving observation efficiency (throughput) by making it easy to readjust the electron gun and an electron optical system, where the electron gun and the electron microscope are a field emission type electron gun and an electron microscope equipped with the electron gun, respectively, and a focal distance of the electron gun does not vary in the case of varying extraction voltage during observation.SOLUTION: A field emission type electron gun has a configuration including a magnetic field lens using a permanent magnet which is positioned at an adjustment potential other than an extraction voltage potential and to which a variable adjustment potential relative to an electron source is given. 【課題】本発明は、電界放出型電子銃及びそれを備える電子顕微鏡において、観察中に引出電圧を変更した場合、電子銃の焦点距離が変化せず、電子銃や電子光学系の再調整を容易にし、観察効率(スループット)を向上することが出来る電子銃及び電子顕微鏡を提供することである。【解決手段】上記の課題に鑑み、本発明は以下の構成を有する。電界放出電子銃において、引出電圧電位とは別の調整電位におかれ、電子源に対して、可変の調整電位が与えられた永久磁石を用いた磁場レンズを有することを特徴とする電界放出電子銃。【選択図】 図2
Bibliography:Application Number: JP20130142230