SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To achieve the vibration resistance of a semiconductor device while relaxing the strain between an insulating substrate of a semiconductor module and an adhesive layer of a metal base.SOLUTION: Stress relaxation layers 6 and 7 are provided on circuits 3 and 4 of an insulating s...

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Bibliographic Details
Main Authors BETSUSHIBA NORIYUKI, ISHII RYUICHI
Format Patent
LanguageEnglish
Japanese
Published 05.01.2015
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Summary:PROBLEM TO BE SOLVED: To achieve the vibration resistance of a semiconductor device while relaxing the strain between an insulating substrate of a semiconductor module and an adhesive layer of a metal base.SOLUTION: Stress relaxation layers 6 and 7 are provided on circuits 3 and 4 of an insulating substrate in a semiconductor module 9. A metal base with which the semiconductor module is in contact is divided into a thin first metal base 11 having low rigidity and a thick second metal base 13 having high rigidity. The semiconductor module 9 is bonded to the metal base 11, and then the first and second metal bases are bonded to integrate them. 【課題】半導体モジュールの絶縁基板と、金属ベースとの接着層の歪緩和をしたまま、半導体装置の耐振性を確立する。【解決手段】半導体モジュール9内の絶縁基板の回路3、4に応力緩和層6、7を設け、半導体モジュールが接触する金属ベースを、薄肉低剛性の第1の金属ベース11と厚肉高剛性の第2の金属ベース13に分割し、半導体モジュール9を第1の金属ベース11に接着後、第1と第2の金属ベースを接合し一体化する。【選択図】図1
Bibliography:Application Number: JP20130127134