SUBSTRATE PROCESSING APPARATUS, SUBSTRATE DETECTING METHOD AND STORAGE MEDIUM

• Main Authors: ARAKI SHINICHIRO, KANEKO TOMOHIRO
• Format: Patent
• Language: English; Japanese
• Published: 05.01.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of reducing a time required for a recovery operation of a wafer.SOLUTION: A substrate processing apparatus 10 includes a placing base 40 for storing a plurality of wafers W in predetermined receiving positions P-P, respectively, and a wafer transporting arm 31 for receiving the wafer W located in each of the receiving positions P-Pof the placing base 40 and transporting the wafer W to the outside of the placing base 40. The wafer transporting arm 31 is provided with a pressure meter 56 for detecting whether or not the wafer exists on the wafer transporting arm 31. A control unit 80 allows the wafer transporting arm 31 to move to one of the receiving positions P-Pof the placing base 40, determines whether the wafer W exists at one of the receiving positions P-Pon the basis of a detection signal from the pressure meter 56, and when determining that the wafer W does not exist at one of the receiving positions P-P, allows the wafer transporting arm 31 to pass through one of the receiving positions P-Pto move to the next receiving position. 【課題】ウエハの回収動作に要する時間を短縮することが可能な基板処理装置を提供する。【解決手段】基板処理装置１０は、複数のウエハＷをそれぞれ所定の受取位置Ｐ１〜Ｐ１０に収容する置き台４０と、置き台４０の各受取位置Ｐ１〜Ｐ１０にあるウエハＷを受け取るとともに、当該ウエハＷを置き台４０の外方へ搬送するウエハ搬送アーム３１とを備えている。ウエハ搬送アーム３１には、ウエハ搬送アーム３１上にウエハＷが存在するか否かを検知する圧力計５６が設けられている。制御部８０は、ウエハ搬送アーム３１を置き台４０の一の受取位置Ｐ１〜Ｐ１０に移動させ、圧力計５６からの検知信号に基づいて当該受取位置Ｐ１〜Ｐ１０にウエハＷが存在するかを判断し、当該受取位置にウエハＷが存在しないと判断した場合、ウエハ搬送アーム３１を当該受取位置を通過して次の受取位置まで移動させる。【選択図】図２