POLY(CYCLOHEXYLETHYLENE)-POLYACRYLATE BLOCK COPOLYMERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME

• Main Authors: PHILIUP DENE FUSTAD, HILLMYER MARC ANDREW, BATES FRANK STEVEN, KENNEMUR JUSTIN GLENN
• Format: Patent
• Language: English; Japanese
• Published: 18.12.2014
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide poly(cyclohexylethylene)-polyacrylate block copolymers for use in patterning of nanolithography.SOLUTION: A block copolymer is derived by polymerizing a first block derived from a cyclo-alkyl vinyl polymer, a hydrogenated vinyl aromatic polymer or a hydrogenated vinyl pyridine polymer with a second block derived from an acrylate monomer. The χ parameter of the block copolymer, which is a measure of interactions between the first block and the second block, is about 0.05 or more when measured at a temperature of 200°C to 210°C. 【課題】ナノリソグラフィのパターニングに使用されるポリ（シクロヘキシルエチレン）−ポリアクリレートブロックコポリマーを提供。【解決手段】シクロアルキルビニルポリマー、水素化ビニル芳香族ポリマー又は水素化ビニルピリジンポリマー由来の第一のブロックに、アクリレートモノマー由来の第二のブロックを重合することによりブロックコポリマーが誘導され、前記ブロックコポリマーの第一のブロック及び第二のブロックの間の相互作用の尺度であるχパラメータは、２００?Ｃ〜２１０?Ｃの温度で測定した場合、約０．０５以上の値を有している。【選択図】なし