SULFONIUM SALT AND OPTICAL ACID GENERATOR

• Main Authors: TAKASHIMA YUSAKU, UTSUMI YOSHIYUKI, KAIHO TAKAAKI, NAMITO TOSHIAKI, SUZUKI KAZUO, KOMURO YOSHITAKA, IKEDA TAKUYA, FURUTA TSUYOSHI
• Format: Patent
• Language: English; Japanese
• Published: 15.12.2014
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; ADHESIVES; CHEMISTRY; DYES; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; PAINTS; POLISHES

PROBLEM TO BE SOLVED: To provide a sulfonium salt exhibiting high solubilities with organic solvents and high decomposition efficiencies in relation to lights of deep-UV (254 nm) wavelengths or shorter, in particular, and a novel optical acid generator including the sulfonium salt.SOLUTION: The provided sulfonium salt is expressed by the formula (1); an optical acid generator including the sulfonium salt is also provided [in the formula, Rexpresses an electron-attracting group; Rand Rexpress alkyl groups having 1-5 carbon atoms; p and q are independently integers of 0 to 5; Xexpresses a monovalent counter anion]. 【課題】有機溶剤に対する溶解性が高く、特に、ｄｅｅｐ−ＵＶ（２５４ｎｍ）以下の波長の光に対して高い分解効率を有するスルホニウム塩及び該スルホニウム塩を含んでなる新たな光酸発生剤の提供。【解決手段】式（１）で示されるスルホニウム塩及び該スルホニウム塩を含有する光酸発生剤。〔式中、Ｒ１は電子吸引性基を表し；Ｒ２およびＲ３は炭素数１〜５のアルキル基などを表し；ｐ、ｑはそれぞれ独立に０〜５の整数であり；Ｘ−は一価の対アニオンを表す。〕【選択図】なし