WIRING BOARD
PROBLEM TO BE SOLVED: To provide a wiring board which can achieve high density of a wiring layer.SOLUTION: A wiring board 1 comprises a core layer 11, a first insulation layer and a second insulation layer which are laminated on one surface side of the core layer, and a third insulation layer and a...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
04.12.2014
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a wiring board which can achieve high density of a wiring layer.SOLUTION: A wiring board 1 comprises a core layer 11, a first insulation layer and a second insulation layer which are laminated on one surface side of the core layer, and a third insulation layer and a solder resist layer 40 which are laminated on the other surface side of the core layer. Each of the first insulation layer and the second insulation layer includes a plurality of insulation layers, a first wiring layer is formed between the first insulation layers, and a second wiring layer is formed on a surface where the second insulation layers are laminated. The first insulation layer and the third insulation layer are composed of a thermosetting resin and the second insulation layer and the solder resist layer 40 are composed of a photosensitive resin. In each of the first insulation layer and the second insulation layer, via wiring is embedded, and one end face of the first via wiring embedded in the top layer of the first insulation layer is exposed from a surface where the second insulation layer is laminated and directly connected to the second wiring layer. The surface of the first insulation layer, where the second insulation layer is laminated is a polished surface and the wiring density of the second wiring layer is formed higher than the wiring density of the first wiring layer.
【課題】配線層の高密度化を実現可能な配線基板を提供する。【解決手段】配線基板1は、コア層11と、コア層の一面側に積層された第1絶縁層及び第2絶縁層と、コア層の他面側に積層された第3絶縁層及びソルダーレジスト層40とを有し、第1絶縁層及び第2絶縁層は各々複数の絶縁層を備え、第1絶縁層間には第1配線層が形成され、第2絶縁層が積層された面には第2配線層が形成され、第1絶縁層及び第3絶縁層は熱硬化性樹脂からなり、第2絶縁層及びソルダーレジスト層40は感光性樹脂からなり、第1絶縁層及び第2絶縁層にはビア配線が埋設され、第1絶縁層の最上層に埋設された第1ビア配線の一方の端面は、第2絶縁層が積層された面から露出し、第2配線層と直接接合されており、第1絶縁層の第2絶縁層が積層された面は研磨された面であり、第2配線層は、第1配線層よりも配線密度が高く形成されている。【選択図】図1 |
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Bibliography: | Application Number: JP20130260033 |