ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING APPARATUS

PROBLEM TO BE SOLVED: To facilitate detachment of a wafer in an electrostatic chuck that is used while being heated.SOLUTION: An electrostatic chuck includes a mounting table 20 formed of ceramics containing aluminum oxide and yttrium oxide, and an electrostatic electrode 22 arranged in the mounting...

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Bibliographic Details
Main Authors MIYAMOTO KAZUYOSHI, MIYAZAWA MASAKUNI
Format Patent
LanguageEnglish
Japanese
Published 20.11.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To facilitate detachment of a wafer in an electrostatic chuck that is used while being heated.SOLUTION: An electrostatic chuck includes a mounting table 20 formed of ceramics containing aluminum oxide and yttrium oxide, and an electrostatic electrode 22 arranged in the mounting table 20. The content rate of yttrium oxide is set in the range of 0.5-2.0 wt%. 【課題】加熱して使用する静電チャックにおいて、ウェハの脱離を容易にすること。【解決手段】酸化アルミニウム及び酸化イットリウムを含むセラミックスから形成された載置台２０と、載置台２０の中に配置された静電電極２２とを含む静電チャックであり、酸化イットリウムの含有率が０．５ｗｔ％〜２．０ｗｔ％に設定される。【選択図】図２
Bibliography:Application Number: JP20130099269