SILICA-BASED POROUS FILM, ARTICLE HAVING SILICA-BASED POROUS FILM, AND METHOD FOR PRODUCING THE SAME ARTICLE

• Main Authors: MATSUO HIROKI, KUWABARA YUICHI, NAKAMURA YUKI, MORITA SHINPEI, KAWAI YOHEI, MIYAJIMA TATSUYA
• Format: Patent
• Language: English; Japanese
• Published: 17.11.2014
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOUNDS THEREOF; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; INORGANIC CHEMISTRY; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-METALLIC ELEMENTS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHYSICS; POLISHES; USE OF MATERIALS THEREFOR; WOODSTAINS

PROBLEM TO BE SOLVED: To provide a silica-based porous film that has good antireflection performance and antifouling property and is produced in a simple production process, to provide an article having the silica-based porous film and to provide a method for producing the article.SOLUTION: The silica-based porous film has a plurality of holes in a matrix composed mainly of silica, has a refractive index in the range of 1.10-1.38. The holes include a hole having a diameter of not less than 20 nm. The number of holes having a diameter of not less than 20 nm opening to the outermost surface of the film is 13/10nmor less and the outermost surface has a water contact angle of 70° or more. 【課題】良好な反射防止性能と防汚性とを有し、製造工程も簡便なシリカ系多孔質膜、これを備える物品およびその製造方法の提供。【解決手段】シリカを主成分とするマトリックス中に複数の空孔を有するシリカ系多孔質膜であって、屈折率が１．１０〜１．３８の範囲内であり、前記空孔として、直径２０ｎｍ以上の空孔を含み、最表面に開口した直径２０ｎｍ以上の空孔の数が１３個／１０６ｎｍ２以下であり、前記最表面の水接触角が７０?以上であることを特徴とする、シリカ系多孔質膜。【選択図】なし