ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

• Main Authors: SCHOLZ AXEL, GERHARD-WILLHELM ZIEGLER, MICHAEL GERHARD, STEPHAN KELLNER, MARKUS DEGUNTHER, FRANK SCHLESENER, VLADIMIR DAVYDENKO, MANFRED MAUL, BISCHOFF THOMAS, MIRCO KERN, NILS HAVERKAMP, THOMAS STAMMLER, DANIEL WALLDORF, IGOR HUREVICH
• Format: Patent
• Language: English; Japanese
• Published: 13.11.2014
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an illumination system for microlithography in which undesirable effects on other illumination parameters are avoided for specific illumination parameters.SOLUTION: A first raster array 12 has a first raster element 24 arranged on a first plane of an illumination sys...