ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY

• Main Authors: SCHOLZ AXEL, GERHARD-WILLHELM ZIEGLER, MICHAEL GERHARD, STEPHAN KELLNER, MARKUS DEGUNTHER, FRANK SCHLESENER, VLADIMIR DAVYDENKO, MANFRED MAUL, BISCHOFF THOMAS, MIRCO KERN, NILS HAVERKAMP, THOMAS STAMMLER, DANIEL WALLDORF, IGOR HUREVICH
• Format: Patent
• Language: English; Japanese
• Published: 13.11.2014
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an illumination system for microlithography in which undesirable effects on other illumination parameters are avoided for specific illumination parameters.SOLUTION: A first raster array 12 has a first raster element 24 arranged on a first plane of an illumination system or adjacently thereto and forming a luminous flux, and generates the raster array of a secondary light source. A transmission optical system has a second raster array 15 having a second raster element 26 forming a luminous flux by transmitting the secondary light source into an illumination field while superposing. One of the first raster elements 24 is assigned to one of the second raster elements 26, the first raster array 12 has the first raster element 24 of at least two types (I, II, III) having different luminous flux impact effect, and is assigned with at least one individual distance ( I, II, III) between the second raster elements 26 of the second raster array 15. 【課題】特定の照明パラメータに対して他の照明パラメータに対する望ましくない影響を回避するマイクロリソグラフィのための照明系を提供する。【解決手段】第１のラスタ配列１２は、照明系の第１の平面又はこの平面に隣接して配置された光束を形成する第１のラスタ要素２４を有し、２次光源のラスタ配列を生成する。伝達光学系は、照明視野内への２次光源を重ね合わせて伝達し、光束を形成する第２のラスタ要素２６を有する第２のラスタ配列１５を有する。第１のラスタ要素２４のうちの１つは、第２ののラスタ要素２６のうちの１つに割り当てられ、第１のラスタ配列１２は、異なる光束影響効果を有する少なくとも２つのタイプ（Ｉ，ＩＩ，ＩＩＩ）の第１のラスタ要素２４を有し、第２のラスタ配列１５の第２のラスタ要素２６との間の少なくとも１つの個別の距離（ΔＩ，ΔＩＩ，ΔＩＩＩ）が割り当てられる。【選択図】図２