ELECTROSTATIC CHUCK

PROBLEM TO BE SOLVED: To provide an electrostatic chuck which can obtain high dielectric strength voltage against discharge in a gas introduction path or which can perform temperature control on an adsorption object with high uniformity in wafer temperature.SOLUTION: An electrostatic chuck comprises...

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Bibliographic Details
Main Authors YOSHII YUICHI, ANADA KAZUTERU
Format Patent
LanguageEnglish
Japanese
Published 06.11.2014
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Summary:PROBLEM TO BE SOLVED: To provide an electrostatic chuck which can obtain high dielectric strength voltage against discharge in a gas introduction path or which can perform temperature control on an adsorption object with high uniformity in wafer temperature.SOLUTION: An electrostatic chuck comprises: a ceramic dielectric substrate having a first principal surface for mounting an adsorption object, a second principal surface on the side opposite to the first principal surface and a through hole provided across from the second principal surface to the first principal surface; a metal base plate which supports the ceramic dielectric substrate and has a gas introduction path connected to the through hole; and an insulator plug having a ceramic porous body provided in the gas introduction path, and a ceramic insulation film which is provided between the ceramic porous body and the gas introduction path and is denser than the ceramic porous body. The ceramic insulation film digs from a surface of the ceramic porous body into the inside of the ceramic porous body. 【課題】ガス導入路内での放電に対して高い絶縁耐圧を得ることができる、あるいは、吸着の対象物に対してウェーハ温度均一性の高い温度制御を行うことができる静電チャックを提供することを目的とする。【解決手段】吸着の対象物を載置する第1主面と、第1主面とは反対側の第2主面と、第2主面から第1主面にかけて設けられた貫通孔と、を有するセラミック誘電体基板と、セラミック誘電体基板を支持し、貫通孔と連通するガス導入路を有する金属製のベースプレートと、ガス導入路に設けられたセラミック多孔体と、セラミック多孔体とガス導入路との間に設けられセラミック多孔体よりも緻密なセラミック絶縁膜と、を有する絶縁体プラグと、を備え、セラミック絶縁膜は、セラミック多孔体の表面からセラミック多孔体の内部に食い込んだことを特徴とする静電チャックが提供される。【選択図】図1
Bibliography:Application Number: JP20140064870