FILM DEPOSITION UNIT AND FILM DEPOSITION APPARATUS

• Main Authors: INOMATA YOSUKE, ISHIKAWA SHINYA, YOKOTA HIROKO, MATSUSHIMA NORIHIKO, KISHU ATSUO
• Format: Patent
• Language: English; Japanese
• Published: 30.10.2014
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a film deposition unit which includes a gas introducing unit which has a simple structure, is easily maintained, is applied to a large area, and provides a wide range of a deposition condition to be set.SOLUTION: A film deposition unit 101 includes a body part 1 having a film deposition chamber 11, and a gas introducing unit 20. The gas introducing unit 20 includes: a top plate 21 which includes a first introduction part 21a and a second introduction part 21b which are for introducing a first gas and a second gas, and separates the body part 1 to an inside and an outside; a pipe 7a extending from the first introduction part 21a to the film deposition chamber 11; a shower plate 23b which is disposed through diffusion chambers 24a and 24b, has multiple second gas discharge port for supplying the second gas to the film deposition chamber 11, and a first gas discharge port for supplying the first gas to the film deposition chamber 11 by being opened to be connected to a pipe 7a; and cylindrical columnar members 25a-25c which have the pipe 7a inserted therein, and connect the top plate 21 and the shower plate 23b. 【課題】 単純な構成でメンテナンス容易な、大面積にも適用でき、設定できる成膜条件の範囲が広いガス導入ユニットを備えた成膜ユニットを提供する。【解決手段】 成膜ユニット１０１は、成膜室１１を有する本体部１と、ガス導入ユニット２０とを有する。ガス導入ユニット２０は、第１のガス，第２のガスを導入するための第１の導入部２１ａ，第２の導入部２１ｂを有するとともに本体部１の内外を隔てる天板２１と、第１の導入部２１ａから成膜室１１へ延びるパイプ７ａと、天板２１との間に拡散室２４ａ，２４ｂを介して配置され、第２のガスを成膜室１１へ供給するための複数の第２のガス吐出口を有するとともに、パイプ７ａと繋がるように開口して第１のガスを成膜室１１へ供給するための第１のガス吐出口を有するシャワープレート２３ｂと、内側にパイプ７ａが挿入されているとともに天板２１とシャワープレート２３ｂとを接続する筒状の柱状部材２５ａ〜２５ｃとを有する。【選択図】 図４